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Need a Profiler Plan B?
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ECD
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3 Ways to Increase Plasma Uniformity
Process temperature is the most important parameter in the plasma process. Process temperature has primary control over etch rate and has a secondary effect on etch uniformity. Read more.
Plasma Etch
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Ask the Experts Member |
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Dr. Rita Mohanty
Director Advanced Development
Speedline Technologies
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Dr. Mohanty, PhD in Chemical Engineering, has over fifteen years experience in both industry and academic relating to engineering and electronic polymers, electronic packaging and assembly. She has experience in SMT process optimization and Lead-free transition.
Dr. Rita Mohanty has submitted responses to the following questions.
Stencil Aperture Ratio
The best answer to this question is "it depends"...
It depends on the type of paste (Type III, IV etc...), ...
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Are you sitting comfortably?
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Vision Engineering
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